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Journal of Materials Science and Technology

Volumn 26, Issue 8, 2010, Pages 673-678

Influence of Sputtering Pressure on the Structure and Mechanical Properties of Nanocomposite Ti-Si-N Thin Films

(3) Chawla, Vipin a Jayaganthan, R a Chandra, Ramesh a

a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE (India)

Author keywords

Microstructural characterization; Nanoindentation; Ti Si N films

Indexed keywords

CHARACTERIZATION TECHNIQUES; DEPOSITION PARAMETERS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MICRO-STRUCTURAL CHARACTERIZATION; MICROSTRUCTURAL ANALYSIS; SI (100) SUBSTRATE; SPUTTERING PRESSURES; TI-SI-N; XRD ANALYSIS; XRD PEAKS; YOUNG'S MODULUS;

ATOMIC FORCE MICROSCOPY; CRYSTALLITE SIZE; FIELD EMISSION; FIELD EMISSION MICROSCOPES; MECHANICAL PROPERTIES; METALLIC FILMS; NANOCOMPOSITES; NANOINDENTATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SURFACE ROUGHNESS; THIN FILMS; TITANIUM COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

CRYSTAL ATOMIC STRUCTURE;

EID: 77957037470 PISSN: 10050302 EISSN: None Source Type: Journal
DOI: 10.1016/S1005-0302(10)60105-3 Document Type: Article

Times cited : (21)

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