Influence of deposition conditions on the microstructure and mechanical properties of Ti-Si-N films by DC reactive magnetron sputtering

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 360-365

  Kim, Soo Hyun ^a   Kim, Jong Kuk ^b   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

Author keywords

DC reactive magnetron sputtering; Microhardness; Nanocomposite; Ti Si N

Indexed keywords

MAGNETRON SPUTTERING; MICROHARDNESS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; TITANIUM ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0037011109     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00833-7     Document Type: Conference Paper

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