Microstructure and mechanical properties of reactively sputtered Ti-Si-N nanocomposite films

Materials Letters

Volumn 59, Issue 19-20, 2005, Pages 2442-2445

  Mei, Fanghua ^a   Shao, Nan ^a   Hu, Xiaoping ^a   Li, Geyang ^a   Gu, Mingyuan ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Mechanical property; Microstructure; Reactive sputtering; Ti Si N nanocomposite films

Indexed keywords

COATINGS; COMPOSITE MATERIALS; MECHANICAL PROPERTIES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTERING; TITANIUM NITRIDE; WEAR RESISTANCE;

PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD); REACTIVE SPUTTERING; TI-SI-N NANOCOMPOSITE FILMS; WEAR RESISTANT COATINGS;

PLASTIC FILMS;

EID: 20444477125     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2005.03.019     Document Type: Article

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