Double aberration correction in a low-energy electron microscope

Ultramicroscopy

Volumn 110, Issue 11, 2010, Pages 1358-1361

  Schmidt, Th ^a,b   Marchetto, H ^a   Levesque P L ^a   Groh, U ^b   Maier, F ^b   Preikszas, D ^c,f   Hartel, P ^c,h   Spehr, R ^c   Lilienkamp, G ^e   Engel, W ^a   Fink, R ^d   Bauer, E ^e,g   Rose, H ^c   Umbach, E ^b   Freund, H J ^a  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^d UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^e CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^f CARL ZEISS SMT AG   (Germany)

^g ARIZONA STATE UNIVERSITY   (United States)

^h CEOS GmbH   (Germany)

Author keywords

Aberration correction; High resolution electron microscopy; Low energy electron microscopy

Indexed keywords

ABERRATION CORRECTION; CHROMATIC ABERRATION; ELECTRON MICROSCOPIC OBSERVATIONS; ELECTRON OPTICAL SYSTEM; HIGH RESOLUTION; LATERAL RESOLUTION; LENS SYSTEMS; LOW ENERGY ELECTRONS; LOW-ENERGY ELECTRON MICROSCOPY;

ABERRATIONS; ELECTRON MICROSCOPES; ELECTRONS; OPTICAL SYSTEMS;

HIGH RESOLUTION ELECTRON MICROSCOPY;

GOLD;

ACCURACY; ARTICLE; CALIBRATION; CONTROLLED STUDY; ELECTRON MICROSCOPE; ELECTRON MICROSCOPY; IMAGE ENHANCEMENT; IMAGE PROCESSING; IMAGE RECONSTRUCTION; LENS POWER; LIGHT INTENSITY; MICROSCOPE IMAGE; OPTICAL RESOLUTION; SENSITIVITY ANALYSIS; SURFACE PROPERTY; VISIBILITY;

EID: 77956263959     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.07.007     Document Type: Article

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