Atmospheric-pressure plasmas for wide-area thin-film deposition and etching

Plasma Processes and Polymers

Volumn 4, Issue 3, 2007, Pages 253-265

  Hopfe, Volkmar ^a   Sheel, David W ^b  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

Anti scratch coatings; Atmospheric pressure glow discharges (APGD); DC discharges; Microwave discharges; Plasma etching; Plasma enhanced chemical vapor deposition (PE CVD); Remote plasma processes; Silicon nitride; Silicon oxide

Indexed keywords

COATINGS; ELECTRIC DISCHARGES; GLOW DISCHARGES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING;

ANTI-SCRATCH COATINGS; ATMOSPHERIC PRESSURE GLOW DISCHARGES (APGD); ATMOSPHERIC-PRESSURE PLASMAS; MICROWAVE DISCHARGES; THIN-FILM DEPOSITION; WIDE-AREA THIN FILMS;

THIN FILMS;

EID: 34248394679     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600202     Document Type: Article

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