Influence of the gas phase on the water vapor barrier properties of SiOx films deposited from RF and dual-mode plasmas

Plasma Processes and Polymers

Volumn 3, Issue 8, 2006, Pages 606-617

  Sonnenfeld, Axel ^a   Bieder, Andrea ^a   von Rohr, Philipp Rudolf ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Langmuir probe (LP); Optical emission spectroscopy (OES); Plasma enhanced chemical vapor deposition (PE CVD); Silicon oxide; Water vapor transmission rate

Indexed keywords

FILM GROWTH; LANGMUIR BLODGETT FILMS; OXIDATION; PLASMA PROBES; PLASMA SOURCES; SUBSTRATES;

LANGMUIR PROBE; OPTICAL EMISSION SPECTROSCOPY; POSITIVE ION DENSITY; SILICON OXIDE; WATER VAPOR TRANSMISSION RATE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 33750300153     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200500159     Document Type: Article

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