Characterization of nanocrystalline indium tin oxide thin films prepared by ion beam sputter deposition method

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 6891-6896

  Venkatachalam, S ^a   Nanjo, Hiroshi ^a   Hassan, Fathy M B ^a   Kawasaki, Kazunori ^a   Kanakubo, Mitsuhiro ^a   Aizawa, Takafumi ^a   Aida, Tsutomu ^a   Ebina, Takeo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Atomic force microscopy; Electrical conductivity AR; Indium tin oxide; Ion beam sputtering; Optical transmittance; Scanning electcron microscopy; Thin films; X ray diffraction

Indexed keywords

DEPOSITION CONDITIONS; DEPOSITION TIME; ELECTRICAL CONDUCTIVITY; GLASS SUBSTRATES; GRAIN SIZE; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; ION BEAM SPUTTER DEPOSITION; ION BEAM SPUTTERING; ITO FILMS; NANOCRYSTALLINES; OPTICAL TRANSMITTANCE; PREFERRED ORIENTATIONS; VARIABLE PARAMETERS; VISIBLE REGION; VISIBLE SPECTRAL REGIONS; XRD PATTERNS;

ARGON; ATOMIC FORCE MICROSCOPY; BEAM PLASMA INTERACTIONS; DEPOSITION; DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; INDIUM; INDIUM COMPOUNDS; ION BEAMS; ION BOMBARDMENT; IONS; OPACITY; OXIDE FILMS; OXYGEN; OXYGEN VACANCIES; PHOTOLITHOGRAPHY; SPUTTERING; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; TITANIUM COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY POWDER DIFFRACTION; X RAYS;

ITO GLASS;

EID: 77956229248     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.034     Document Type: Article

References (25)

1. H.C. Lee, and O. Ok Park Vacuum 80 2006 880
2. A. Antony, M. Nisha, R. Manoj, and M.K. Jayaraj Appl. Surf. Sci. 225 2004 294
3. S. Takayama, A. Tanaka, T. Sugawara, and T. Himuro Jpn. J. Appl. Phys. 41 2002 L619
4. R.B.H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi J. Appl. Phys. 83 1998 2631
5. A. El Hichou, A. Kachouane, J.L. Bubendorff, M. Addou, J. Ebothe, M. Troyon, and A. Bougrine Thin Solid Films 458 2004 263
6. Y. Han, D. Kim, J.-S. Cho, S.-K. Koh, and Y.S. Song Sol. Energy Mater. Sol. Cells 65 2001 211
7. H. Kim, J.S. Horwitz, G. Kushto, A. Pique, Z.H. Kafafi, and C.M. Gilmore J. Appl. Phys. 88 2000 6021
8. D. Kim, Y. Han, J.-S. Cho, and S.-K. Koh Thin Solid Films 377/378 2000 81
9. L. Kerkache, A. Layadi, E. Dogheche, and D. Remiens J. Phys. D Appl. Phys. 39 2006 184
10. A.K. Kulkarni, Kirk H. Schulz, T.S. Lim, and M. Khan Thin Solid Films 345 1999 273
11. Y.S. Jung, D.W. Lee, and D.Y. Jeon Appl. Surf. Sci. 221 2004 136
12. S. Boycheva, A.K. Sytchkova, M.L. Grilli, and A. Piegari Thin Solid Films 515 2007 8469
13. H.-N. Cui, V. Teixeira, L.-J. Meng, R. Martins, and E. Fortunato Vacuum 82 2008 1507
14. T.S. Sathiaraj Microelectron. J. 39 2008 1444
15. P. Thilakan, C. Minarini, S. Loreti, and E. Terzini Thin Solid Films 388 2001 34
16. Y. Shigesato, S. Takaki, and T. Haranou Appl. Surf. Sci. 48 49 1991 269
17. D.F. Lii J.L Huang, I. J. Jen, S.S. Lin, P. Sajgalik Surf. Coat. Technol. 192 2005 106
18. Y. Xu, J. Gao, X. Zheng, X. Wang, T. Wang, and H. Chena J. Lumin. 122 123 2007 908
19. John C.C. Fan Appl. Phys. Lett. 34 1979 515
20. S. Bhagwata, and R.P. Howson Surf. Coat. Technol. 111 1999 163
21. S.M. Rozati, and T. Ganj Am. J. Appl. Sci. 2 2005 1106
22. Li-Jian Meng, and M.P. dos Santos Thin Solid Films 289 1996 65
23. Robert Eason Pulsed Laser Deposition of Thin Films 2007 John-Wiley & Sons, Inc., publication p. 245.
24. M. Bender, N. Katsarakis, E. Gagaoudakis, E. Hourdakis, E. Douloufakis, V. Cimalla, and G. Kiriakidis J. Appl. Phys. 90 2001 5382
25. Y. Hu, X. Diao, C. Wang, W. Hao, and T. Wang Vacuum 75 2004 183