SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 111, Issue 2-3, 1999, Pages 163-171

Use of magnetron-sputtering technique for the control of the properties of indium tin oxide thin films

(2) Bhagwat, S a Howson, R P b

a ABASAHEB GARWARE COLLEGE (India)

b LOUGHBOROUGH UNIVERSITY (United Kingdom)

Author keywords

Indium tin oxide (ITO); Magnetron sputtering; Transparent conducting oxide

Indexed keywords

ANNEALING; FILM PREPARATION; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; STOICHIOMETRY; SUBSTRATES; ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; LIGHT TRANSMISSION; MECHANICAL PROPERTIES; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION; TRANSPARENCY;

INDIUM TIN OXIDE FILMS;

PROTECTIVE COATINGS; SEMICONDUCTING FILMS;

COATING; FILM; SPUTTERING;

INDIUM TIN OXIDE;

EID: 0032672149 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(98)00727-0 Document Type: Article

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