SCOPUS 정보 검색 플랫폼

Volumn 80, Issue 8, 2006, Pages 880-887

The evolution of the structural, electrical and optical properties in indium-tin-oxide thin film on glass substrate by DC reactive magnetron sputtering

(2) Lee, Ho Chul a Ok Park, O b

a Samsung Corning Co Ltd (South Korea)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

DC reactive magnetron sputtering; Indium tin oxide (ITO); Thickness dependent

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; GLASS; MAGNETRON SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DC REACTIVE MAGNETRON SPUTTERING; INDIUM-TIN-OXIDE (ITO); THICKNESS-DEPENDENT;

INDIUM ALLOYS;

EID: 33747397226 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2005.11.069 Document Type: Article

Times cited : (45)

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