Influence of target to substrate spacing on the properties of ITO thin films

Applied Surface Science

Volumn 225, Issue 1-4, 2004, Pages 294-301

  Antony, Aldrin ^a   Nisha, M ^a   Manoj, R ^a   Jayaraj, M K ^a  

^a Department of Physics   (India)

Author keywords

Annealing; Indium tin oxide; RF magnetron sputtering

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; PULSED LASER DEPOSITION; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; VACUUM DEPOSITED COATINGS;

INDIUM TIN OXIDE; RF MAGNETRON SPUTTERING;

SEMICONDUCTING INDIUM COMPOUNDS;

EID: 1342347327     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.10.017     Document Type: Article

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