How to extract the sheet resistance and hall mobility from arbitrarily shaped planar four-terminal devices with extended contacts

IEEE Transactions on Electron Devices

Volumn 57, Issue 9, 2010, Pages 2087-2097

  Cornils, Martin ^a   Rottmann, Axel ^a   Paul, Oliver ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Conformal mapping; four contact device; Hall mobility; resistance measurement; sheet resistance; van der Pauw method

Indexed keywords

CONTACT DEVICE; DEVICE GEOMETRIES; DIFFUSED SILICON; MAGNETIC SENSITIVITY; MOBILITY VALUE; RESISTANCE MEASUREMENT; TERMINAL DEVICES; VAN DER PAUW; VAN DER PAUW METHOD;

ABERRATIONS; CONFORMAL MAPPING; ELECTRIC RESISTANCE; HALL MOBILITY; MAGNETIC FIELDS; SHEET RESISTANCE;

GALVANOMAGNETIC EFFECTS;

EID: 77956057590     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2053493     Document Type: Article

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