Quantitative imaging of sheet resistance with a scanning near-field microwave microscope

Applied Physics Letters

Volumn 72, Issue 7, 1998, Pages 861-863

  Steinhauer, D E ^a   Vlahacos, C P ^a   Dutta, S K ^a   Feenstra, B J ^a   Wellstood, F C ^a   Anlage, Steven M ^a  

^a Bldg 142   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; IMAGING TECHNIQUES; MATHEMATICAL MODELS; METALLIC FILMS; OPTICAL FREQUENCY CONVERSION; OPTICAL RESOLVING POWER; PROBES; Q FACTOR MEASUREMENT; SHEET METAL;

FEEDBACK CIRCUIT; QUANTITATIVE IMAGING; SCANNING NEAR FIELD MICROWAVE MICROSCOPE; SHEET RESISTANCE;

MICROWAVE SPECTROSCOPY;

EID: 0032000997     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120918     Document Type: Article

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