Sheet resistance determination using symmetric structures with contacts of finite size

IEEE Transactions on Electron Devices

Volumn 54, Issue 10, 2007, Pages 2756-2761

  Cornils, Martin ^a   Doelle, Michael ^a,b   Paul, Oliver ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

^b Silicon Microstructures Inc   (United States)

Author keywords

Conformal mapping; Device characterization; Four contact device; Resistance measurement; Sheet resistance; Van der Pauw method

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONFORMAL MAPPING; ELECTRIC RESISTANCE MEASUREMENT; INTERPOLATION;

DEVICE CHARACTERIZATION; FOUR-CONTACT DEVICE; VAN DER PAUW METHOD;

SHEET RESISTANCE;

EID: 35148840453     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2007.906219     Document Type: Article

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