Sheet resistance measurement of non-standard cleanroom materials using suspended Greek cross test structures

IEEE Transactions on Semiconductor Manufacturing

Volumn 19, Issue 1, 2006, Pages 2-9

  Enderling, Stefan ^a,b   Brown III, Charles L ^a,c,e   Smith, Stewart ^a,b   Dicks, Martin H ^a,d   Stevenson, J Tom M ^a,b   Mitkova, Maria ^a,c,f,g   Kozicki, Michael N ^a,c,h,i,j  

^a IEEE   (United Kingdom)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

^c Arizona State University   (United States)

^d INFINEON TECHNOLOGIES AG   (Germany)

^e Technology Management Company   (United States)

^f UNIVERSITY OF CINCINNATI   (United States)

^g ARIZONA STATE UNIVERSITY   (United States)

^h RAYTHEON COMPANY   (United States)

ⁱ Raytheon Systems Ltd ^*  (United States)

^j Axon Technologies Corporation   (United States)

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Author keywords

Critical dimension metrology; Greek cross; Non standard cleanroom materials; Self patterning; Sheet resistance; Test structure; Van der pauw

Indexed keywords

CRITICAL DIMENSION METROLOGY; GREEK CROSS; NON-STANDARD CLEANROOM MATERIALS; SELF PATTERNING; SHEET RESISTANCE; VAN DER PAUW;

ELECTRIC RESISTANCE; EVAPORATION; POLYSILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE;

CMOS INTEGRATED CIRCUITS;

EID: 33244462646     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.863248     Document Type: Conference Paper

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