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Volumn 518, Issue 19, 2010, Pages 5442-5446

Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature

(7) Tang, W T a Ying, Z F a Hu, Z G b Li, W W b Sun, J a Xu, N a Wu, J D a

a FUDAN UNIVERSITY (China)

b EAST CHINA NORMAL UNIVERSITY (China)

Author keywords

Hafnia; Low temperature preparation; Optical property; Plasma assisted deposition; Thin films; Zirconia

Indexed keywords

DEPOSITED FILMS; DIRECT BAND GAP; ELECTRON CYCLOTRON RESONANCE MICROWAVE; EXTINCTION COEFFICIENTS; FUSED SILICA PLATES; HAFNIA; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; MONOCLINIC PHASIS; NEAR INFRARED; OXYGEN PLASMAS; PLASMA ASSISTED DEPOSITION; REACTIVE PULSED LASER DEPOSITION; SI SUBSTRATES; SYNTHESIS AND CHARACTERIZATIONS; ULTRAVIOLET ABSORPTION;

CYCLOTRONS; DEPOSITION; ELECTRIC DISCHARGES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; FUSED SILICA; HAFNIUM; HAFNIUM COMPOUNDS; OXIDE FILMS; OXYGEN; PHASE INTERFACES; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SILICA; SILICON COMPOUNDS; SILICON OXIDES; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; VAPOR DEPOSITION; ZIRCONIA; ZIRCONIUM; ZIRCONIUM ALLOYS;

FILM PREPARATION;

EID: 77955658322 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.04.012 Document Type: Article

Times cited : (43)

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