Hafnium oxide thin films deposited by reactive middle-frequency dual-magnetron sputtering

Thin Solid Films

Volumn 515, Issue 20-21, 2007, Pages 7984-7989

  Pervak, V ^a   Krausz, F ^a,b   Apolonski, A ^b,c  

^a MAX PLANCK INSTITUT FÜR QUANTENOPTIK   (Germany)

^b UNIVERSITY OF MUNICH   (Germany)

^c INSTITUTE OF AUTOMATION AND ELECTROMETRY   (Russian Federation)

Author keywords

Deposition process; Hafnium; Optical coatings

Indexed keywords

DEPOSITION; DIELECTRIC DEVICES; FLOW OF GASES; HAFNIUM COMPOUNDS; MAGNETRON SPUTTERING; OPTICAL COATINGS; REACTIVE SPUTTERING; REFRACTIVE INDEX;

HAFNIUM OXIDE; REACTIVE DUAL MAGNETRON SPUTTERING SYSTEMS;

THIN FILMS;

EID: 34547657150     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.180     Document Type: Article

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