Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source

Thin Solid Films

Volumn 350, Issue 1, 1999, Pages 203-208

  Gilo, M ^a   Croitoru, N ^b  

^a Elbit Systems Electro Optics Elop Limited   (Israel)

^b TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON GUNS; EVAPORATION; HAFNIUM; HAFNIUM COMPOUNDS; HIGH POWER LASERS; ION BOMBARDMENT; ION SOURCES; MIRRORS; REFRACTIVE INDEX; THIN FILMS;

GRIDLESS END-HALL ION SOURCE; HAFNIUM OXIDE; ION-ASSISTED DEPOSITION;

OPTICAL FILMS;

EID: 0032628330     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00226-6     Document Type: Article

References (12)

1. Foltyn S.R., Newnam B.E. SPIE. 288:1981;21.
2. Edlou S.M., Smajkiewicz A., Al-Jumaily G.A. Appl. Opt. 32:1993;5601.
3. Kuo C.T., Kwor R., Jones K.M. Thin Solid Films. 213:1992;257.
4. Martin P.J., Netterfilld R.P. Thin Solid Films. 199:1991;351.
5. Fulton M.L. SPIE. 2253:1994;374.
6. Kaufman H.R., Robinson R.S., Seddon R.I. J. Vac. Sci. Technol. A. 5:1987;2081.
7. Macleod H.A. Thin-Film Optical Filters. 2nd. 1986;369.
8. Tikhonravov A.V., Trubetskov M.K., Sullivan B.T., Dobrowolski J.A. Appl. Opt. 36:1997;7188.
9. McNally J.J., Al-Jumaily G.A., Wilson S.R., McNeil J.R. SPIE. 540:1985;479.
10. Gilo M., Croitoru N. Thin Solid Films. 283:1996;84.
11. Waldorf A.J., Dobrowolski J.A., Sullivan B.T., Plante L.M. Appl. Opt. 32:1993;5583.
12. A. Zoller, R. Gotzelmann, H. Hagedon, W. Klug, K. Matl, SPIE, Proc., 3133 (1997).