Atomically smooth stress-corrosion cleavage of a hydrogen-implanted crystal

Physical Review Letters

Volumn 105, Issue 7, 2010, Pages

  Moras, Gianpietro ^a,b,c   Ciacchi, Lucio Colombi ^d,e   Elsässer, Christian ^a,b   Gumbsch, Peter ^a,b   De Vita, Alessandro ^c,f  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM   (Germany)

^c DEMOCRITOS NATIONAL SIMULATION CENTER   (Italy)

^d UNIVERSITY OF BREMEN   (Germany)

^e FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM   (Germany)

^f KING'S COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMICAL SIMULATION; H2 MOLECULE; INTERNAL PRESSURE; INTERNAL SURFACES; MULTISCALES; SILICON CRYSTAL; STRESS-CORROSION; STRESSED SILICON;

CORROSION; HYDROGEN;

PLATELETS;

EID: 77955627994     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.105.075502     Document Type: Article

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