Structural transformation of acrylic resin upon controlled electron-beam exposure yields positive and negative resists

Advanced Functional Materials

Volumn 15, Issue 7, 2005, Pages 1147-1154

  Chen, Jem Kun ^a   Ko, Fu Hsiang ^a   Chang, Feng Chih ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; CROSSLINKING; ELECTRIC RESISTANCE; ELECTRON BEAMS; ETCHING; IRRADIATION; POLYMERS; POROUS MATERIALS; SEMICONDUCTOR MATERIALS;

ACRYLIC RESINS; ELECTRON-BEAM EXPOSURE; RESISTS; STRUCTURAL TRANSFORMATION;

RESINS;

EID: 22944487611     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200400077     Document Type: Article

References (37)

1. J.-K. Chen, F.-H. Ko, H.-L. Chen, F.-C. Chang, Jpn. J. Appl. Phys., Part 1 2003, 42, 3838.
2. E. Katoh, H. Sugishwa, A. Oshima, Y. Tabata, T. Seguchi, T. Yamazaki, Radiat. Phys, Chem. 1999, 54, 165.
3. B. Fuchs, U. Seheier, Macromolecules 2000, 33, 120.
4. B. Fuchs, U. Lappan, K. Lunkwitz, U. Scheler, Macromolecules 2002, 35, 9079.
5. T. R. Dargaville, G. A. George, D. J. T. Hill, U. Scheler, A. K. Whittaker, Macromolecules 2003, 36, 7138.
6. L. F. Thompson, C. G. Willson, M. J. Bowden, Introduction to Microlithography, ACS, Washington, DC 1994.
7. W. Moreau, D. Merritt, W. Moyer, M. Hatzakis, D. Johnson, L. A. Pederson, J. Vac. Sci. Technol. 1979, 16, 1989.
8. R. G. Brault, L. J. Miller, Polym. Eng. Sci. 1980, 20, 1064.
9. B. J. Lin, J. Vac. Sci. Technol. 1975, 12, 1317.
10. Y. Minura, T. Ohkubo, T. Takeuchi, K. Sekikawa, Jpn. J. Appl Phys. 1975, 17, 1317.
11. H. Sotobayashi, F. Asmussen, K. Thimru, W. Schnatel, H. Betz, D. Einfeld, Polym. Bull. 1980, 7, 95.
12. A. Gupta, R. Liang, F. D. Tsay, J. Moscanin, Macromolecules 1980, 13, 1696.
13. A. Tadd, J. Polym. Sci. 1960, 42, 223.
14. R. B. Fox, L. G. Isaacs, S. Stokes, J. Polym. Sci. 1963, 1, 1079.
15. C. David, D. Fuld, G. Genuskens, Makromol. Chem. 1970, 139, 269.
16. C. R. Chen, R. I. Knight, L. Pollock, J. Polym. Sci. 1987, 25, 127.
17. K. Miyazaki, K. Hisada, T. Hori, Y. Kondo, E. Saji, T. Kimura, Sen'i Gakkaishi 2000, 56, 126.
18. S. Tsuneda, K. Saito, T. Sugo, K. Makuuchi, Radiat. Phys. Chem. 1995, 46, 239.
19. S. Tsuneda, K. Saito, H. Mitsuhara, T. Sugo, J. Electrochem. Soc. 1995, 142, 3659.
20. K. Uezu, K. Saito, S. Furusaki, T. Sugo, I. Ishigaki, Radiat. Phys. Chem. 1992, 40, 31.
21. J. E. Wilson, J. Macromol. Sci., Chem. 1974, 8, 307.
22. a) C. J. Hawker, Acc. Chem. Res. 1997, 30, 373.
23. b) J. Xia, K. Matyjaszewski, Chem. Rev. 2001, 101, 2921.
24. a) T. E. Patten, J. Xia, T. Abernathyl, K. Matyjaszewski, Science 1996, 272, 866.
25. b) S. Liu, J. V. M. Weaver, Y. Tang, N. C. Billingham, S. P. Armes, K. Tribe, Macromolecules 2002, 55, 6121.
26. c) J. F. Hester, P. Banerjee, Y. Y. Won, A. Akthankul, M. H. Acar, A. M. Mayes, Macromolecules 2002, 35, 7652.
27. d) S. Lu, Q. L. Fan, S. Y. Liu, S. J. Chua, W. Huang, Macromolecules 2002, 35, 9875.
28. W. H. Wong, J. Zhou, E. Y. B. Pun, Appl. Phys. Lett. 2001, 78, 2110.
29. J. O. Choi, J. A. Moore, J. C. Corelli, J. P. Silverman, H. Bakhru, J. Vac. Sci. Technol., B 1988, 6, 2286.
30. H. Hiraoka, IBM J. Res. Dev. 1977, 21, 121.
31. A. R. Shultz, J. Polym. Sci. 1959, 55, 369.
32. K. Biemann, Spectral Data for Structure Determination of Organic Compounds, Springer-Verlag, Berlin 1983.
33. S. M. Sze, Semiconductor Devices - Physics and Technology, John Wiley and Sons, New York 2001.
34. C. Y. Chang, S. M. Sze, ULSI Technology, McGraw-Hill, New York 1996.
35. S. Wolf, R. Tauber, Silicon Processing for the VLSI Era, Lattice Press, CA 1986.
36. P. Martens, S. Yamamoto, K. Edamatsu, Y. Uetani, L. Pain, R. Palla, M. Ross, W. Livesay, Proc. SPIE - Int. Soc. Opt. Eng. 2001, 4345, 138.
37. T. Sarubbi, M. Ross, M. Neisser, T. Kocab, B. Beauchemin, W. Livesay, S. Wong, W. Ng, Proc. SPIE - Int. Soc. Opt. Eng. 2001, 4345, 211.