Multilayer bottom topography effect on actinic mask blank inspection signal

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Terasawa, Tsuneo ^a   Tanaka, Toshihiko ^a   Suga, Osamu ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; EUV; Mask blank; Multilayer; Phase defect; Smoothing deposition

Indexed keywords

CHARACTERIZATION; COMPUTER SIMULATION; DEPOSITION; EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYERS; SURFACE TOPOGRAPHY;

ACTINIC INSPECTION; MASK BLANKS; PHASE DEFECT; SMOOTHING DEPOSITION;

MASKS;

EID: 36249017820     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728934     Document Type: Conference Paper

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