Actinic EUVL mask blank inspection and phase defect characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Yamane, Takeshi ^a   Iwasaki, Teruo ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; EUVL mask; Particle; Phase defect; Real defect

Indexed keywords

ACTINIC INSPECTION; EUVL MASK; PARTICLE; PHASE DEFECT; REAL DEFECT;

DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION EQUIPMENT; MASKS; PROBABILITY;

INSPECTION;

EID: 69949182755     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824258     Document Type: Conference Paper

References (11)

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