Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2824-2828

  Goldberg, Kenneth A ^a   Barty, Anton ^b   Liu, Yanwei ^a   Kearney, Patrick ^c   Tezuka, Yoshihiro ^d   Terasawa, Tsuneo ^d   Taylor, John S ^b   Han, Hak Seung ^c   Wood, Obert R ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c SEMATECH   (United States)

^d ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEMODULATION; LIGHTING; LITHOGRAPHY; MEASUREMENT THEORY; MULTILAYERS; ULTRAVIOLET DEVICES;

ACTINIC INSPECTION; CROSS COMPARISON MEASUREMENTS; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; MULTILAYER DEFECTS;

MASKS;

EID: 33845256682     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2375085     Document Type: Article

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