Structural and optical characterization of Al-doped ZnO films prepared by thermal oxidation of evaporated Zn/Al multilayered films

Materials Chemistry and Physics

Volumn 123, Issue 1, 2010, Pages 314-321

  Rusu, G G ^a   Rambu A P ^a   Buta, V E ^a   Dobromir, M ^a   Luca, D ^a   Rusu, M ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

Optical properties; Thin films; Vacuum deposition; XPS; XRD

Indexed keywords

ABSORBANCES; AIR FLOW; AL CONTENT; AL-DOPED ZNO; ALUMINUM-DOPED ZINC OXIDE; CRYSTALLINITIES; DOPED ZNO; ENERGY BANDGAPS; GLASS SUBSTRATES; HIGH TRANSMITTANCE; IN-VACUUM; MULTI-LAYERED; MULTI-LAYERED FILMS; NIR REGIONS; OPTICAL CHARACTERIZATION; PREFERENTIAL ORIENTATION; STRUCTURAL CHARACTERISTICS; SUBSTRATE SURFACE; TENSILE RESIDUAL STRESS; THERMAL OXIDATION; WURTZITES; XPS; XRD; ZNO;

ALUMINUM; ALUMINUM COATINGS; DEPOSITION; ENERGY GAP; FILM PREPARATION; METALLIC COMPOUNDS; METALLIC FILMS; OPTICAL PROPERTIES; OXIDATION; OXIDE FILMS; PHYSICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS; VACUUM; VACUUM DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE; ZINC SULFIDE;

OPTICAL FILMS;

EID: 77953129435     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.04.022     Document Type: Article

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