Microstructure control of ZnO thin films prepared by single source chemical vapor deposition

Thin Solid Films

Volumn 458, Issue 1-2, 2004, Pages 43-46

  Deng, H ^a   Russell, J J ^b   Lamb, R N ^b   Jiang, B ^a   Li, Y ^a   Zhou, X Y ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

C axis orientation; Columnar; Single source chemical vapor deposition; Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; EPITAXIAL GROWTH; EVAPORATION; GALLIUM NITRIDE; MICROSTRUCTURE; OPTICAL FIBERS; SCANNING ELECTRON MICROSCOPY; SENSORS; X RAY DIFFRACTION; ZINC OXIDE;

C-AXIS ORIENTATION; COLUMNAR; PHOTOANODES; SINGLE SOURCE CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 2542485837     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.288     Document Type: Article

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