Effects of annealing on optical properties of Zn-implanted ZnO thin films

Journal of Alloys and Compounds

Volumn 458, Issue 1-2, 2008, Pages 569-573

  Xue, S W ^a,b   Zu, X T ^a   Shao, L X ^b   Yuan, Z L ^a   Zheng, W G ^c   Jiang, X D ^c   Deng, H ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b LINGNAN NORMAL UNIVERSITY   (China)

^c RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Optical properties; Sol gel process; Thin films

Indexed keywords

FUSED SILICA; ION IMPLANTATION; LIGHT ABSORPTION; OPTICAL PROPERTIES; SOL-GEL PROCESS; THIN FILMS; X RAY DIFFRACTION;

NEAR BAND EDGE (NBE); OPTICAL ABSORPTION MEASUREMENTS; URBACH ENERGY;

ZINC OXIDE;

EID: 42949127552     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2007.04.239     Document Type: Article

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