Texture analysis of Al-doped ZnO thin films prepared by in-line reactive MF magnetron sputtering

Applied Surface Science

Volumn 226, Issue 4, 2004, Pages 378-386

  Hong, R J ^a   Helming, K ^b   Jiang, X ^a,c   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b BRUKER AXS GMBH   (Germany)

^c UNIVERSITY OF SIEGEN   (Germany)

Author keywords

Al doped ZnO (AZO); Reactive deposition; Texture analysis; Transparent conductive oxides (TCOs); X ray diffraction

Indexed keywords

ALUMINUM; CRYSTAL STRUCTURE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; TEXTURES; THIN FILMS; VOLUME FRACTION; X RAY DIFFRACTION;

AL-DOPED ZNO (AZO); REACTIVE DEPOSITION; TEXTURE ANALYSIS; TRANSPARENT CONDUCTIVE OXIDES (TCOS);

ZINC OXIDE;

EID: 1842527583     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.10.040     Document Type: Article

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