Synchrotron radiation-induced total reflection X-ray fluorescence analysis

TrAC - Trends in Analytical Chemistry

Volumn 29, Issue 6, 2010, Pages 479-496

  Meirer, F ^a,c   Singh, A ^a   Pianetta, P ^a   Pepponi, G ^b   Streli, C ^c   Homma, T ^d  

^a SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^b ITC IRST   (Italy)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^d WASEDA UNIVERSITY   (Japan)

Author keywords

Angle dependent measurement; GI XRF; Glancing incident; SR TXRF; Synchrotron radiation; Total reflection X ray fluorescence analysis; TXRF; TXRF XANES; X ray absorption near edge structure spectroscopy

Indexed keywords

ANGLE-DEPENDENT; ANGLE-DEPENDENT MEASUREMENT; GLANCING INCIDENT; SR-TXRF; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; TXRF-XANES;

ABSORPTION; ABSORPTION SPECTROSCOPY; ELECTROMAGNETIC WAVE REFLECTION; FLUORESCENCE; INDUSTRIAL APPLICATIONS; SPECTRUM ANALYSIS; SYNCHROTRON RADIATION; SYNCHROTRONS; X RAY ABSORPTION; X RAYS;

X RAY ANALYSIS;

COPPER; FERROUS CHLORIDE; FERROUS SULFATE; FERROUS SULFIDE; IRON; IRON OXIDE; NANOPARTICLE; SILICONE;

AIR ANALYSIS; ATMOSPHERE; ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; CONTROLLED STUDY; DUAL ENERGY X RAY ABSORPTIOMETRY; FEASIBILITY STUDY; PARTICULATE MATTER; PRIORITY JOURNAL; REFLECTOMETRY; REVIEW; SEMICONDUCTOR; SENSITIVITY ANALYSIS; SYNCHROTRON; VAPOR; WATER CONTAMINATION; X RAY FLUORESCENCE;

EID: 77953083406     PISSN: 01659936     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.trac.2010.04.001     Document Type: Review

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