Using VPDICP-MS to monitor trace metals on unpatterned wafer surfaces

MICRO

Volumn 16, Issue 6, 1998, Pages 79-89

  Settembre, Greg ^a,c   Debrah, Ebenezer ^b,d,e,f,g  

^a IBM   (United States)

^b MDS SCIEX   (Canada)

^c MARIST COLLEGE   (United States)

^d PERKINELMER INC   (United States)

^e UNIVERSITY OF GHANA   (Ghana)

^f LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^g UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DECOMPOSITION; MASS SPECTROMETRY; PHASE COMPOSITION; SILICON WAFERS; STANDARDS; SURFACE PHENOMENA; TRACE ANALYSIS;

COLD PLASMA CONDITION; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; MEMBRANE DESOLVATOR; SURFACE CONTAMINATION; VAPOR PHASE DECOMPOSITION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032100066     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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