Total reflection x-ray fluorescence analysis - A review

X-Ray Spectrometry

Volumn 36, Issue 5, 2007, Pages 289-300

  Wobrauschek, P ^a  

^a TU WIEN   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SPECIATION; DEPTH PROFILING; ELECTROMAGNETIC WAVE REFLECTION; FLUORESCENCE; FLUORESCENCE SPECTROSCOPY; SILICON WAFERS; SURFACE ANALYSIS; SYNCHROTRONS; TRACE ELEMENTS; X RAY ABSORPTION SPECTROSCOPY; X RAY TUBES;

DETECTION LIMITS; ENERGY DISPERSIVE X-RAY; ENERGY-DISPERSIVE X-RAYS; EXCITATION SOURCES; NANOGRAMS; SI WAFER; SPECIAL ENERGY; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; TRACES ELEMENTS; ULTRATRACES;

SYNCHROTRON RADIATION;

EID: 34548737574     PISSN: 00498246     EISSN: 10974539     Source Type: Journal    
DOI: 10.1002/xrs.985     Document Type: Article

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