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Volumn 1, Issue 12, 2009, Pages 2711-2720

Nanoscale patterning of organic monolayers by catalytic stamp lithography: Scope and limitations

Author keywords

hydrosilylation; nanoscale patterning; organic monolayer; PDMS stamp; silicon surface block copolymer; soft lithography

Indexed keywords

NANOSCALE PATTERNING; ORGANIC MONOLAYER; PDMS STAMP; SILICON SURFACE BLOCK COPOLYMER; SOFT LITHOGRAPHY;

EID: 77951616061     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am900602m     Document Type: Article
Times cited : (23)

References (108)
  • 68
    • 0005242457 scopus 로고
    • Overview and Evolution of Semiconductor Wafer Contamination and Cleaning Technology
    • Kern, W., Ed.; Noyes Publications: Park Ridge, NJ
    • Kern, W. Overview and Evolution of Semiconductor Wafer Contamination and Cleaning Technology. In Handbook of Semiconductor Wafer Cleaning Technology; Kern, W., Ed.; Noyes Publications: Park Ridge, NJ, 1993; Vol. 3.
    • (1993) Handbook of Semiconductor Wafer Cleaning Technology , vol.3
    • Kern, W.1
  • 87


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.