Massively parallel dip-pen nanolithography with 55 000-pen two-dimensional arrays

Angewandte Chemie - International Edition

Volumn 45, Issue 43, 2006, Pages 7220-7223

  Salaita, Khalid ^a   Wang, Yuhuang ^a   Fragala, Joseph ^b   Vega, Rafael A ^a   Liu, Chang ^c   Mirkin, Chad A ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

^b NANOINK INC   (United States)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

Dip pen nanolithography; Lithography; Nanofabrication; Parallelization; Scanning probe

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; GRAVITATION; MOLECULAR DYNAMICS; NANOTECHNOLOGY; SUBSTRATES;

DIP-PEN NANOLITHOGRAPHY; PARALLELIZATION; SCANNING PROBE;

LITHOGRAPHY;

GOLD; TIN;

ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; INSTRUMENTATION; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY;

EQUIPMENT DESIGN; GOLD; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES; TIN;

EID: 33751009671     PISSN: 14337851     EISSN: None     Source Type: Journal    
DOI: 10.1002/anie.200603142     Document Type: Article

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