Effect of high substrate bias and hydrogen and nitrogen incorporation on density of states and field-emission threshold in tetrahedral amorphous carbon films

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 2, 2010, Pages 411-422

  Panwar, O S ^a   Khan, M A ^a   Satyanarayana, B S ^b   Bhattacharyya, R ^a   Mehta, B R ^c   Kumar, S ^a   Ishpal, ^a  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b National Physical Laboratory ^*  (India)

^c INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; HYDROGEN; NITROGEN; SUBSTRATES; VACUUM APPLICATIONS;

AS-GROWN; DENSITY OF STATE; EMISSION CURRENT DENSITY; FILTERED CATHODIC VACUUM ARC; NEGATIVE SUBSTRATES; NITROGEN INCORPORATION; SUBSTRATE BIAS; TA-C FILM; TETRAHEDRAL AMORPHOUS CARBON (TA-C) FILMS; TETRAHEDRAL AMORPHOUS CARBON FILMS;

CARBON FILMS;

EID: 77950625956     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3359586     Document Type: Article

References (66)

1. P. J. Fallon, V. S. Veerasamy, C. A. Davis, J. Robertson, G. A. J. Amaratunga, W. I. Milne, and J. K. Koskinen, Phys. Rev. B 0163-1829 48, 4777 (1993). 10.1103/PhysRevB.48.4777
2. Y. Lifshitz, Diamond Relat. Mater. 0925-9635 12, 130 (2003). 10.1016/S0925-9635(03)00014-1 (Pubitemid 36453787)
3. J. Robertson, Mater. Sci. Eng. R. 0927-796X 37, 129 (2002). 10.1016/S0927-796X(02)00005-0
4. D. R. McKenzie, Rep. Prog. Phys. 0034-4885 59, 1611 (1996). 10.1088/0034-4885/59/12/002
5. A. Grill, Diamond Relat. Mater. 0925-9635 12, 166 (2003). 10.1016/S0925-9635(03)00018-9 (Pubitemid 36447551)
6. J. T. H. Tsai, K. B. K. Teo, and W. I. Milne, J. Vac. Sci. Technol. B 1071-1023 20, 1 (2002). 10.1116/1.1426368 (Pubitemid 34221375)
7. N. S. Xu and S. E. Huq, Mater. Sci. Eng. R. 0927-796X 48, 47 (2005). 10.1016/j.mser.2004.12.001 (Pubitemid 40282474)
8. A. Vaseashta and D. D. Malinovska, Sci. Technol. Adv. Mater. 1468-6996 6, 312 (2005). 10.1016/j.stam.2005.02.018 (Pubitemid 41203494)
9. Y. Lifshitz, Diamond Relat. Mater. 0925-9635 8, 1659 (1999). 10.1016/S0925-9635(99)00087-4
10. R. L. Boxman, V. Zhitomirsky, B. Alterkop, E. Gidalevich, I. Beilis, M. Keider, and S. Goldsmith, Surf. Coat. Technol. 0257-8972 86-87, 243 (1996). 10.1016/S0257-8972(96)03023-X (Pubitemid 126405942)
11. I. I. Aksenov, V. A. Belou, V. G. Padalka, and V. M. Khoroshikh, Sov. Phys. Tech. Phys. 0038-5662 4, 428 (1978).
12. X. Shi, B. K. Tay, H. S. Tan, L. Zhong, Y. Q. Tu, S. R. P. Silva, and W. I. Milne, J. Appl. Phys. 0021-8979 79, 7234 (1996).
13. S. Xu, D. Flynn, B. K. Tay, S. Prawer, K. W. Nugent, S. R. P. Silva, Y. Lifshitz, and W. I. Milne, Philos. Mag. B 1364-2812 76, 351 (1997). 10.1080/01418639708241099
14. X. Shi, B. K. Tay, and S. P. Lau, Int. J. Mod. Phys. B 0217-9792 14, 136 (2000). 10.1142/S0217979200000145
15. S. Anders, A. Anders, M. R. Dickinson, R. A. MacGill, and I. G. Brown, IEEE Trans. Plasma Sci. 0093-3813 25, 670 (1997). 10.1109/27.640683
16. A. Anders and A. V. Kulkarni, Mater. Res. Soc. Symp. Proc. 0272-9172 675, W 11.1 (2001).
17. M. C. Polo, J. L. Andujar, A. Hart, J. Robertson, and W. I. Milne, Diamond Relat. Mater. 0925-9635 9, 663 (2000). 10.1016/S0925-9635(99)00339-8
18. T. Schuelke, T. Witke, H. J. Scheibe, P. Siemroth, B. Schultrich, O. Zimmer, and J. Vetter, Surf. Coat. Technol. 0257-8972 120-121, 226 (1999). 10.1016/S0257-8972(99)00480-6
19. A. Anders, W. Fong, A. V. Kulkarni, F. W. Ryan, and C. S. Bhatia, IEEE Trans. Plasma Sci. 0093-3813 29, 768 (2001). 10.1109/27.964472 (Pubitemid 33137825)
20. E. Alakoski, M. Kiuru, V. M. Tiainen, and A. Anttila, Diamond Relat. Mater. 0925-9635 12, 2115 (2003). 10.1016/S0925-9635(03)00238-3 (Pubitemid 37529390)
21. B. S. Satyanarayana, H. Takahashi, T. Narusawa, and A. Hiraki, Mater. Res. Soc. Symp. Proc. 0272-9172 675, W10.2 (2001).
22. A. Hiraki and B. S. Satyanarayana, IEICE Trans. Electron. 0916-8524 86-C, 816 (2003).
23. B. Schultrich, H. J. Scheibe, and H. Mai, Adv. Eng. Mater. 1438-1656 2, 419 (2000). 10.1002/1527-2648(200007)2:7<419::AID-ADEM4197>3.0.CO;2-M
24. B. S. Satyanarayana, J. Robertson, and W. I. Milne, J. Appl. Phys. 0021-8979 87, 3126 (2000). 10.1063/1.372309
25. O. S. Panwar, M. Alim Khan, B. Bhattacharjee, A. K. Pal, B. S. Satyanarayana, P. N. Dixit, R. Bhattacharyya, and M. Y. Khan, Thin Solid Films 0040-6090 515, 1597 (2006). 10.1016/j.tsf.2006.05.024 (Pubitemid 44716087)
26. O. S. Panwar, M. Alim Khan, Mahesh Kumar, S. M. Shivaprasad, B. S. Satyanarayana, P. N. Dixit, R. Bhattacharyya, and M. Y. Khan, Thin Solid Films 0040-6090 516, 2331 (2008). 10.1016/j.tsf.2007.09.024 (Pubitemid 351174246)
27. O. S. Panwar, M. Alim Khan, P. N. Dixit, B. S. Satyanarayana, R. Bhattacharyya, Sushil Kumar, and C. M. S. Rauthan, Indian J. Pure Appl. Phys. 0019-5596 46, 255 (2008).
28. O. S. Panwar M. Alim Khan, G. Bhagavanarayana, P. N. Dixit, Sushil Kumar, and C. M. S. Rauthan, Indian J. Pure Appl. Phys. 0019-5596 46, 797 (2008).
29. K. D. Mackenzie, P. G. Le Comber, and W. E. Spear, Philos. Mag. B 1364-2812 46, 377 (1982). 10.1080/13642818208246448
30. M. A. Lampert and P. Mark, Current Injection in Solids (Academic, New York, 1970).
31. G. W. Nespurek and J. Sworakowski, J. Appl. Phys. 0021-8979 51, 2098 (1980). 10.1063/1.327880 (Pubitemid 11430898)
32. S. R. P. Silva and G. A. J. Amaratunga, Thin Solid Films 0040-6090 253, 146 (1994). 10.1016/0040-6090(94)90310-7
33. V. S. Veerasamy, G. A. J. Amaratunga, C. A. Davis, W. I. Milne, P. Hewitt, and M. Weiler, Solid-State Electron. 0038-1101 37, 319 (1994). 10.1016/0038-1101(94)90084-1 (Pubitemid 124017059)
34. W. D. Davis and H. C. Miller, J. Appl. Phys. 0021-8979 40, 2212 (1969). 10.1063/1.1657960
35. R. H. Fowler and L. W. Nordheim, Proc. R. Soc. London, Ser. A 0950-1207 119, 173 (1928). 10.1098/rspa.1928.0091
36. B. S. Satyanarayana, A. Hart, W. I. Milne, and J. Robertson, Appl. Phys. Lett. 0003-6951 71, 1430 (1997). 10.1063/1.119915
37. O. S. Panwar, Nalin Rupesinghe, and G. A. J. Amaratunga, J. Vac. Sci. Technol. B 1071-1023 26, 566 (2008). 10.1116/1.2884762 (Pubitemid 351479198)
38. A. Wisitsora-at, W. P. Kang, J. L. Davidson, and D. V. Kerns, Appl. Phys. Lett. 0003-6951 71, 3394 (1997). 10.1063/1.120346
39. W. J. Li, Z. R. Song, Y. H. Yu, X. Wang, S. C. Zou, and D. S. Shen, J. Appl. Phys. 0021-8979 94, 284 (2003). 10.1063/1.1576304
40. M. Pandey, D. Bhattacharyya, D. S. Patil, K. Ramachandran, and N. Venkatramani, Surf. Coat. Technol. 0257-8972 182, 24 (2004). 10.1016/S0257-8972(03)00876-4 (Pubitemid 38473592)
41. G. A. J. Amaratunga, D. E. Segal, and D. R. McKenzie, Appl. Phys. Lett. 0003-6951 59, 69 (1991). 10.1063/1.105525
42. V. S. Veerasamy, J. Yuan, G. A. J. Amaratunga, W. I. Milne, K. W. R. Gilkes, M. Weiler, and L. M. Brown, Phys. Rev. B 0163-1829 48, 17954 (1993). 10.1103/PhysRevB.48.17954
43. V. S. Veerasamy, G. A. J. Amaratunga, C. A. Davis, A. E. Timbs, W. I. Milne, and D. R. McKenzie, J. Phys.: Condens. Matter 0953-8984 5, L169 (1993). 10.1088/0953-8984/5/13/004
44. C. J. Trong, J. M. Siverten, J. H. Judy, and C. Chand, J. Mater. Res. 0884-2914 5, 2590 (1990).
45. C. A. Davis, D. R. Mckenzie, Y. Yin, E. Kravtchinskaia, G. A. J. Amaratunga, and V. S. Veerasamy, Philos. Mag. B 1364-2812 69, 1133 (1994). 10.1080/01418639408240183
46. D. F. Franceschini, C. A. Achete, and F. L. Freire, Appl. Phys. Lett. 0003-6951 60, 3229 (1992). 10.1063/1.106702
47. O. Amir and R. Kalish, J. Appl. Phys. 0021-8979 70, 4958 (1991). 10.1063/1.349043
48. G. A. J. Amaratunga and S. R. P. Silva, Appl. Phys. Lett. 0003-6951 68, 2529 (1996). 10.1063/1.116173 (Pubitemid 126683965)
49. A. Weber, U. Hoffman, and C. P. Klages, J. Vac. Sci. Technol. A 0734-2101 16, 919 (1998). 10.1116/1.581211 (Pubitemid 128091512)
50. C. Arena, B. Kleinsorge, J. Roberson, W. I. Milne, and M. E. Welland, J. Appl. Phys. 0021-8979 85, 1609 (1999). 10.1063/1.369293
51. Z. Y. Chen, Mater. Lett. 0167-577X 34, 1 (1998). 10.1016/S0167-577X(97) 00129-8
52. J. S. Shim, E. J. Chi, H. K. Baik, and S. M. Lee, J. Appl. Phys. 0021-8979 37, 440 (1998). 10.1143/JJAP.37.440
53. S. Gupta, B. L. Weiss, B. R. Weiner, and G. Morell, J. Appl. Phys. 0021-8979 89, 5671 (2001). 10.1063/1.1367873 (Pubitemid 33598377)
54. O. S. Panwar, Sushil Kumar, S. S. Rajput, Rajnish Sharma, and R. Bhattacharyya, Vacuum 0042-207X 72, 183 (2004).
55. K. C. Park, J. H. Moon, S. J. Chung, J. Jang, M. H. Oh, and W. I. Milne, Appl. Phys. Lett. 0003-6951 70, 1381 (1997). 10.1063/1.119076
56. F. Y. Chuang, C. Y. Sun, H. F. Cheng, W. C. Wang, and I. Lin, Appl. Surf. Sci. 0169-4332 113-114, 259 (1997). 10.1016/S0169-4332(96)00955-5
57. N. Missert, T. A. Friedmann, J. P. Sullivan, and R. G. Copeland, Appl. Phys. Lett. 0003-6951 70, 1995 (1997). 10.1063/1.119078
58. K. R. Lee, K. Y. Eun, S. Lee, and D. R. Jeon, Thin Solid Films 0040-6090 290-291, 171 (1996). 10.1016/S0040-6090(96)09080-3 (Pubitemid 126391083)
59. R. D. Forrest, A. P. Burden, S. R. P. Silva, L. K. Cheah, and X. Shi, Appl. Phys. Lett. 0003-6951 73, 3784 (1998). 10.1063/1.122894 (Pubitemid 128677533)
60. J. P. Zhao, Z. Y. Chen, X. Wang, T. S. Shi, and T. Yano, Appl. Phys. Lett. 0003-6951 76, 191 (2000). 10.1063/1.125699
61. A. Hart, B. S. Satyanarayana, W. I. Milne, and J. Robertson, Appl. Phys. Lett. 0003-6951 74, 1594 (1999) 10.1063/1.123627; A. Hart, B. S. Satyanarayana, W. I. Milne, and J. Robertson, Diamond Relat. Mater. 0925-9635 8, 809 (1999). 10.1016/S0925-9635(98)00305-7
62. J. Robertson, J. Vac. Sci. Technol. B 1071-1023 17, 659 (1999). 10.1116/1.590613
63. Z. H. Huang, P. H. Cutler, N. M. Miskovsky, and T. E. Sullivan, Appl. Phys. Lett. 0003-6951 65, 2562 (1994). 10.1063/1.112636
64. W. Zhu, G. P. Kochanski, S. Jin, L. Seibles, D. C. Jacobson, M. McCormack, and A. E. White, Appl. Phys. Lett. 0003-6951 67, 1157 (1995).
65. J. Robertson, Mater. Res. Soc. Symp. Proc. 0272-9172 498, 197 (1998).
66. A. A. Talin, T. E. Felter, T. A. Freidmann, J. P. Sullivan, and M. P. Siegel, J. Vac. Sci. Technol. A 0734-2101 14, 1719 (1996). 10.1116/1.580326 (Pubitemid 126082105)