Effect of morphology on electron emission characteristics of pulsed laser deposited diamond-like films

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 259-263

  Chuang, F Y ^a   Sun, C Y ^a   Cheng, H F ^b   Wang, W C ^c   Lin, I N ^d  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^d NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC FIELDS; ELECTRON EMISSION; MORPHOLOGY; PULSED LASER APPLICATIONS; SUBSTRATES; SURFACES;

DIAMOND LIKE CARBON FILMS; PULSED LASER DEPOSITION;

THIN FILMS;

EID: 0031547257     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00955-5     Document Type: Article

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