Structural, optical, and field emission properties of hydrogenated amorphous carbon films grown by helical resonator plasma enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 2, 1998, Pages 440-444

  Shim, Jae Yeob ^a   Chi, Eung Joon ^a   Baik, Hong Koo ^a   Lee, Sung Man ^b  

^a Yonsei University   (South Korea)

^b Kangwon National University   (South Korea)

Author keywords

Field emission; Helical resonator plasma enhanced chemical vapor deposition; Hydrogen content; Hydrogenated amorphous carbon

Indexed keywords

AMORPHOUS FILMS; CARBON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRIC CURRENTS; ELECTRON EMISSION; HYDROGEN; HYDROGENATION; ION BOMBARDMENT; METHANE; OPTICAL PROPERTIES; PLASMA APPLICATIONS;

FIELD EMISSIONS; HELICAL RESONATOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0032001210     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.440     Document Type: Article

References (16)

1. Q. Li, J. F. Xu, H. B. Song and X. F. Liu: J. Vac. Sci. Technol. B 14 (1996) 1889.
2. R. A. King, R. A. D. Makenzie, D. W. Smith and N. A. Cade: J. Vac. Sci. Technol. B 13 (1995) 603.
3. V. V. Zhirnov, E. I. Givargizov and P. S. Plekhanov: J. Vae. Sci. Technol. B 13 (1995) 418.
4. F. J. Himpsel, I. A. Knapp, J. A. Van Vechten and D. E. Eastman: Phys. Rev. B 20 (1979) 624.
5. C. Wang, A. Garcia, D. C. Ingram, M. Lake and M. E. Kordesch: Electron. Lett. 27 (1991) 1459.
6. M. W. Geis, J. C. Twichell, C. O. Bozler, D. D. Rathman, N. N. Efremow, K. E. Krohn, M. A. Hollis, R. Uttaro and T. M. Lyszcarz: Abs. 6th Int. Conf. Vacuum Microelectronics (1993) p. 160.
7. Z. Feng, I. G. Brown and J. W. Ager III: J. Mater. Res. 10 (1995) 1585.
8. F. Y. Chuang, C. Y. Sun, H. F. Cheng, C. M. Huang and I. N. Lin: Appl. Phys. Lett. 68 (1996) 1666.
9. E. I. Givargizov: J. Vac. Sci. Technol. B 11 (1993) 449.
10. K. Kamata, T. Inoue, K. Sugai, H. Saithh and K. Maruyama: J. Appl. Phys. 78 (1995) 1394.
11. J. Suzuki and S. Okada: Jpn. J. Appl. Phys. 34 (1995) L1218.
12. I. Nagai, A. Ishitani, H. Kuroda, M. Yoshikawa and N. Nagai: J. Appl. Phys. 67 (1990) 2890.
13. N. Mutsukura, S. Inoue and Y. Machi: Jpn. J. Appl. Phys. 72 (1992) 43.
14. A. Grill and V. Patel: Appl. Phys. Lett. 60 (1992) 2089.
15. M. W. Geis and M. A. Tamor: Encyclopedia of Applied Physics, eds. G. L. Trigg (VCH, New York, 1993) p. 15.
16. J. Robertson and W. I. Milne: Mater. Res. Soc. Symp. Proc. 424 (1997) 381.