Field emission behavior of (nitrogen incorporated) diamond-like carbon films

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 171-175

  Lee, Kwang Ryeol ^a   Eun, Kwang Yong ^a   Lee, Sunup ^b   Jeon, Dong Ryul ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Myong Ji University   (South Korea)

Author keywords

Chemical vapour deposition; Diamond; Field emission; Nitrogen

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BENZENE; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; GLOW DISCHARGES; NITROGEN; SILICON CARBIDE; SILICON WAFERS;

DIAMOND LIKE CARBON FILMS; PLASMA CHEMICAL VAPOR DEPOSITION (PACVD);

DIAMOND FILMS;

EID: 0030386033     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09080-3     Document Type: Article

References (17)

1. M. Geiss, N.N. Efremow, J.D. Woodhouse, M.D. McAleese, M. Marchywka, D.G. Socker and J.F. Hochedez, IEEE Electron. Device Lett., 12 (1991) 456.
2. N. Kumar, C. Xie, N. Potter, A. Krishnan, C. Hilbert, D. Eichman, E. Schlam, H. Schmidt and S. Wagal, Tech. Dig. SID '93, (1993) 43.
3. E.I. Givargizov, L.L. Aksenova, V.G. Galstyan, A.V. Kuznetzov, V.I. Muratova, E.V. Rakova and A.N. Stepanova, in A. Feldman, Y. Tzeng, W.A. Yarbrough, M. Yoshikawa and M. Murakawa (eds.), Proc. 3rd Int. Conf. Applied Diamond Films and Related Materials, Elsevier, Amsterdam, 1995, p. 45.
4. W.B. Choi, J. Liu, M.T. McClure, A.F. Myers, J.J. Cuomo and J.J. Hren, Tech. dig. IVMC '95, Portland, OR, 1995, p. 315.
5. F.J. Himpsel, J.A. Knapp, J.A. Van Vechten and D.E. Eastman, Phys. Rev., B20 (1979) 624.
6. D. Hong, M. Aslam, M. Feldman and M. Olinger, J. Vac. Sci. Technol. B, 12 (1994) 764.
7. Z.-H. Huang, P.H. Cutler, N.M. Miskovsky and T.E. Sullivan, Appl. Phys. Lett., 65 (1994) 2562.
8. N.S. Xu, Y. Tzeng and R.V. Latham, J. Phys., D26 (1993) 1776.
9. G.A.J. Amaratunga and S.R.P. Silva, presented at Proc. ICAS '95, Kobe, Japan, 1995.
10. K.R. Lee, K.Y. Eun, B. Chung and D. Jeon, Tech. Dig. ASID '95, (1995) 175.
11. S. Lee, B. Chung, H. Cho, S. Lee, D. Jeon, S. Lee and K.-R. Lee, Tech. Dig. ASID '95, (1995) 133.
12. F. Rosebury, Handbook of Electron Tube and Vacuum Techniques, American Institute of Physics, New York, 1964.
13. N.S. Xu, R.V. Latham and Y. Tzeng, in M. Yoshikawa, M. Murakawa, Y. Tzeng and W.A. Yarbrough (eds.), Proc. 2nd Int. Conf. Appl. Dia. Films and Rel. Mater., MYU, Tokyo, 1993, p. 779.
14. L.S. Pan, T.E. Felter, D.A.A. Ohlberg, S. Han and J.W. Ager III, presented at Diamond Films '95, Barcelona, 1995.
15. O. Gröning, E. Boschung, O.M. Küttel, E. Schaller and L. Schlapbach, presented at Diamond Films '95, Barcelona, 1995.
16. D. Briggs and J.C. Rivière, in D. Briggs and M.P. Seah (eds.), Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy, Wiley, Chichester, 1983, p. 104.
17. H. Tsai and D.B. Bogy, J. Vac. Sci. Technol., A5 (1987) 3287.