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Volumn 13, Issue 6, 2005, Pages 2127-2134

Super-resolution imaging through a planar silver layer

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC DEVICES; FINITE DIFFERENCE METHOD; FREQUENCIES; IMAGE PROCESSING; LENSES; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS; TUNGSTEN;

EID: 17444418334     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.002127     Document Type: Article
Times cited : (475)

References (8)
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    • J.B. Pendry, "Negative refraction makes a perfect lens," Phys. Rev. Lett. 85, 3966-3969 (2000).
    • (2000) Phys. Rev. Lett. , vol.85 , pp. 3966-3969
    • Pendry, J.B.1
  • 2
    • 0035815370 scopus 로고    scopus 로고
    • Experimental verification of a negative index of refraction
    • R. A. Shelby, D. R. Smith and S. Schultz, "Experimental verification of a negative index of refraction," Science 292, 77-79 (2001).
    • (2001) Science , vol.292 , pp. 77-79
    • Shelby, R.A.1    Smith, D.R.2    Schultz, S.3
  • 3
    • 1642601549 scopus 로고    scopus 로고
    • Near-perfect imaging in a focusing system based on a left-handed-material plate
    • art. no. 077401
    • A. N. Lagarkov and V. N. Kissel, "Near-perfect imaging in a focusing system based on a left-handed-material plate," Phys. Rev. Lett. 92, art. no. 077401 (2004).
    • (2004) Phys. Rev. Lett. , vol.92
    • Lagarkov, A.N.1    Kissel, V.N.2
  • 4
  • 5
    • 17444388409 scopus 로고    scopus 로고
    • Imaging through planar silver lenses in the optical near field
    • R. J. Blaikie and D. O. S. Melville, "Imaging through planar silver lenses in the optical near field," J. Opt. A: Pure Appl. Opt. 7, S176-S183 (2005).
    • (2005) J. Opt. A: Pure Appl. Opt. , vol.7
    • Blaikie, R.J.1    Melville, D.O.S.2
  • 6
    • 0000070622 scopus 로고    scopus 로고
    • Sub-diffraction-limited patterning using evanescent near-field optical lithography
    • M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming, "Sub-diffraction-limited patterning using evanescent near-field optical lithography," Appl. Phys. Lett. 75, 3560-3562 (1999).
    • (1999) Appl. Phys. Lett. , vol.75 , pp. 3560-3562
    • Alkaisi, M.M.1    Blaikie, R.J.2    McNab, S.J.3    Cheung, R.4    Cumming, D.R.S.5
  • 7
    • 4644352724 scopus 로고    scopus 로고
    • Subwavelength photolithography based on surface-plasmon polariton resonance
    • X. G. Luo and T. Ishihara, "Subwavelength photolithography based on surface-plasmon polariton resonance," Opt. Express 12, 3055-3065 (2004), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-14-3055.
    • (2004) Opt. Express , vol.12 , pp. 3055-3065
    • Luo, X.G.1    Ishihara, T.2
  • 8
    • 0000741812 scopus 로고
    • Facts relating to optical science
    • H. F. Talbot, "Facts relating to optical science," Phil. Mag. 9, 401-407 (1836).
    • (1836) Phil. Mag. , vol.9 , pp. 401-407
    • Talbot, H.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.