Plasmonic interference nanolithography with a double-layer planar silver lens structure

Optics Express

Volumn 17, Issue 19, 2009, Pages 16783-16791

  Zeng, Beibei ^a   Yang, Xufeng ^a   Wang, Changtao ^a   Luo, Xiangang ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON EMISSION; PLASMONS; SILVER;

INTERFERENCE LITHOGRAPHY; INTERFERENCE PATTERNS; LITHOGRAPHY PROCESS; PATTERN QUALITY; RESOLUTION LIMITS; RIGOROUS COUPLED WAVE ANALYSIS; SIMPLE STRUCTURES; SURFACE PLASMONS;

LITHOGRAPHY;

EID: 70349193337     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.016783     Document Type: Article

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