Contact optical nanolithography using nanoscale C-shaped apertures

Optics Express

Volumn 14, Issue 21, 2006, Pages 9902-9908

  Wang, Liang ^a   Jin, Eric X ^a   Uppuluri, Sreemanth M ^a   Xu, Xianfan ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; NANOTECHNOLOGY; OPTICAL RESOLVING POWER; PHOTORESISTS; TIME DOMAIN ANALYSIS;

LIGHT CONCENTRATION; NANOMETER SCALE RESOLUTION; OPTICAL NANOLITHOGRAPHY; RECTANGULAR APERTURES;

PHOTOLITHOGRAPHY;

EID: 33750288393     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.009902     Document Type: Article

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