Chemical mechanical polishing of hard disk substrate with α-alumina-g-polystyrene sulfonic acid composite abrasive

Thin Solid Films

Volumn 518, Issue 14, 2010, Pages 3792-3796

  Lei, Hong ^a   Bu, Naijing ^a   Chen, Ruling ^a   Hao, Ping ^a   Neng, Sima ^b   Tu, Xifu ^b   Yuen, Kwok ^b  

^a SHANGHAI UNIVERSITY   (China)

^b Shenzhen Kaifa Magnetic Recording Co Ltd   (China)

Author keywords

Alumina g polystyrene sulfonic acid; Chemical mechanical polishing; Cleaning; Composite abrasive; Hard disk substrate

Indexed keywords

ALUMINA ABRASIVE; COMPOSITE ABRASIVES; DISPERSIBILITIES; FOURIER TRANSFORMED INFRARED SPECTROSCOPY; GRAFT POLYMERIZATION; HARD DISK SUBSTRATE; LASER PARTICLE SIZE ANALYSIS; MICROSCOPY IMAGES; POLISHED SURFACES; POLYSTYRENE SULFONIC ACID; POST-CMP CLEANING; SURFACE ACTIVATION; TESTING CONDITIONS;

ABRASIVES; ACIDS; CHEMICAL CLEANING; CHEMICAL POLISHING; HARD DISK STORAGE; INFRARED LASERS; INFRARED SPECTROSCOPY; NANOTECHNOLOGY; PARTICLE SIZE ANALYSIS; PHOSPHORUS; POLISHING; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

CHEMICAL MECHANICAL POLISHING;

EID: 77950530448     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.003     Document Type: Article

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