CeO2 particles for chemical mechanical planarization

Materials Research Society Symposium - Proceedings

Volumn 767, Issue , 2003, Pages 173-183

  Feng, Xiandong ^a   Her, Yie Shein ^a   Zhang, W Linda ^a   Davis, Jackie ^a   Oswald, Eric ^a   Lu, Jin ^a   Bryg, Vicky ^a   Freeman, Sara ^a   Gnizak, Dave ^a  

^a Ferro Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; AMINES; CHEMICAL MECHANICAL POLISHING; CRYSTALLIZATION; PH EFFECTS; SYNTHESIS (CHEMICAL); THERMAL EFFECTS;

CHEMICAL MECHANICAL PLANARIZATION (CMP);

CERIUM COMPOUNDS;

EID: 0242273329     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-767-f3.8     Document Type: Article

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