Sub-nanometer precision polishing of computer rigid disk substrate

Jixie Gongcheng Xuebao/Chinese Journal of Mechanical Engineering

Volumn 41, Issue 3, 2005, Pages 117-122

  Lei, Hong ^a   Luo, Jianbin ^b   Tu, Xifu ^c   Fang, Liang ^c  

^a SHANGHAI UNIVERSITY   (China)

^b TSINGHUA UNIVERSITY   (China)

^c Shenzhen Kaifa Megnetic Recording Co Ltd   (China)

Author keywords

Chemical mechanical polishing (CMP); CMP mechanism; Rigid disk substrate; Sub nanometer roughness

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; MAGNETIC DISK STORAGE; NANOTECHNOLOGY; PARTICLE SIZE ANALYSIS; SURFACE ROUGHNESS;

AUGER ELECTRON SPECTROGRAM; CMP MECHANISM; RIGID DISK SUBSTRATE; SUB-NANOMETER ROUGHNESS;

CHEMICAL MECHANICAL POLISHING;

EID: 17244379727     PISSN: 05776686     EISSN: None     Source Type: Journal    
DOI: 10.3901/jme.2005.03.117     Document Type: Article

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