Sub-nanometer precision polishing of glass substrate with a colloidal SiO2 slurry

Run Hua Yu Mi Feng/Lubrication Engineering

Volumn , Issue 1, 2006, Pages 31-34

  Lei, Hong ^a   Zhang, Pengzhen ^a   Lu, Haishen ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

Colloidal SiO2 slurry; Glass substrate; Planarization; Sub nanometer roughness

Indexed keywords

GLASS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; POLISHING; SLURRIES; SURFACE ROUGHNESS;

COLLOIDAL SILICA SLURRY; ELECTRONIC PRODUCTS; GLASS SUBSTRATE; PLANARIZATION; SUB-NANOMETER ROUGHNESS; ULTRA-SMOOTH POLISHED SURFACE;

SILICA;

EID: 33645637014     PISSN: 02540150     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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