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Volumn 107, Issue 5, 2010, Pages

Effect of nitrogen plasma power on defect levels in Ni/n-GaN Schottky diodes grown by molecular beam epitaxy

Author keywords

[No Author keywords available]

Indexed keywords

ARRHENIUS; BAND GAPS; BEAM FLUXES; DEEP LEVEL; DEEP LEVEL OPTICAL SPECTROSCOPY; DEEP-LEVEL DEFECTS; DEFECT LEVELS; ENERGY LEVEL; NITROGEN PLASMAS; NITROGEN SOURCES; NITROGEN SPECIES; PLASMA ASSISTED MOLECULAR BEAM EPITAXY; PLASMA DAMAGE; PLASMA POWER; RF PLASMA; SCHOTTKY DIODES;

EID: 77949723956     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3309778     Document Type: Article
Times cited : (12)

References (30)
  • 6
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    • Ph.D. thesis, University of California, Santa Barbara
    • R. L. Coffie, Ph.D. thesis, University of California, Santa Barbara, 2003.
    • (2003)
    • Coffie, R.L.1
  • 17
    • 77949742431 scopus 로고    scopus 로고
    • Ph.D. thesis, The Ohio State University
    • A. M. Armstrong, Ph.D. thesis, The Ohio State University, 2006.
    • (2006)
    • Armstrong, A.M.1
  • 18
    • 77949743491 scopus 로고    scopus 로고
    • Ph.D. thesis, The Ohio State University
    • A. Hierro, Ph.D. thesis, The Ohio State University, 2001.
    • (2001)
    • Hierro, A.1
  • 22
    • 77949744738 scopus 로고    scopus 로고
    • Evans Analytical Group, Application Note 370 (2007)
    • Evans Analytical Group, Application Note 370 (2007).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.