Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 5-8

  Heil, S B S ^a   Langereis, E ^a   Kemmeren, A ^b   Roozeboom, F ^b   Van De Sanden, M C M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; NUCLEATION; OPTIMIZATION; PLASMA APPLICATIONS;

ATOMIC LAYER DEPOSITION; NUCLEATION PHASE; SPECTROSCOPIC ELLIPSOMETRY;

TITANIUM NITRIDE;

EID: 29144472207     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1938981     Document Type: Article

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