Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin films

Microelectronic Engineering

Volumn 85, Issue 3, 2008, Pages 527-533

  Schmidt, D ^a   Strehle, S ^a   Albert, M ^a   Hentsch, W ^b   Bartha, J W ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b FHR Anlagenbau GmbH   (Germany)

Author keywords

ALD; Atomic layer deposition; Ellipsometry; Tantalum nitride; TBTDET

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; CHARACTERIZATION; FILM GROWTH; GROWTH RATE; SPECTROSCOPIC ELLIPSOMETRY; TANTALUM COMPOUNDS;

INJECTION REACTOR TOOL; TANTALUM NITRIDE; TBTDET;

THIN FILMS;

EID: 38949181571     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.09.006     Document Type: Article

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