Novel chemical precursors and novel CVD strategies enabling low temperature epitaxy of Si and Si:C alloys

Thin Solid Films

Volumn 518, Issue 6 SUPPL. 1, 2010, Pages

  Bauer, M ^a   Thomas, S G ^a  

^a ASM AMERICA   (United States)

Author keywords

Carbon precursors; Chemical vapor deposition (CVD); Inhibitor; NMOS stressor; Selective epitaxial growth (SEG); Si:C alloy; Silicon

Indexed keywords

CARBON LEVEL; CARBON PRECURSORS; CHEMICAL PRECURSORS; CO-FLOW; DEPOSITION TEMPERATURES; DICHLOROSILANES; DOPED SILICON; HIGH THROUGHPUT; HIGH VOLUME MANUFACTURING; INHIBITOR; LOW COSTS; LOW TEMPERATURE EPITAXIES; LOW TEMPERATURES; MANUFACTURABILITY; MONOMETHYLSILANE; NMOS STRESSOR; NON-TRADITIONAL; SELECTIVE EPITAXIAL GROWTH; SILICON PRECURSORS; THERMAL BUDGET;

CERIUM ALLOYS; CRYSTAL GROWTH; PROPYLENE; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON ALLOYS;

CHEMICAL VAPOR DEPOSITION;

EID: 73649123543     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.088     Document Type: Article

References (55)

1. Habuka H., Suzuki T., Yamamoto S., Nakamura A., Takeuchi T., and Aihara M. Thin Solid Films 489 (2005) 104
2. Kuijer T.J.M., Giling L.J., and Bloem J. J. Cryst. Growth 22 (1974) 29-33
3. Van der Putte P., Giling L.J., and Bloem J. J. Cryst. Growth 41 (1977) 133
4. Gao G., Cheng C.C., Chen P.J., Choyke W.J., and Yates J.T. Thin Solid Films 225 (1993) 140
5. Aldao C.M., and Weaver J.H. Prog. Surf. Sci. 68 (2001) 189
6. Xie G.J., Nakayama K.S., Trenhaile B.R., Aldao C.M., and Weaver Y.H. Phys. Rev., B 67 (2003) 125321
7. Bauer M., Machkaoutsan V., and Arena C. Semicond. Sci. Technol. 22 1 (2007) S183
8. Fischer P.R., Bauer M., Van Aerde S.R.A., Oosterlaken T.G.M., Yan M., Verweij W.A., Bozon B.W.M., and Zagwijn P.M. ECS Trans. 3 2 (2006) 203
9. Bauer M., Weeks D., and Zhang Y. V. Machkaoutsan. ECS Trans. 3 7 (2006) 187
10. Bauer M., Zhang Y., Weeks D., and Machkaoutsan V. S. G. Thomas. ECS Trans. 6 1 (2007) 419
11. Bauer M., Zhang Y., Weeks D., Brabant P., Italiano J., and Machkaoutsan V. S. G. Thomas. ECS Trans. 13 1 (2008) 287
12. Bauer M., Machkaoutsan V., Zhang Y., Weeks D., Spear J., Thomas S.G., Verheyen P., Kerner C., Clemente F., Bender H., Shamiryan D., Loo R., Hikavyy A., Hoffmann T., and Absil P. S. Biesemans. ECS Trans. 16 10 (2008) 1001
13. Kanoh H., Sugiura O., and Matsmura M. Jpn. J. Appl. Phys. 32 (1993) 2613-2619
14. Mastryukov V.S., Hoffmann M., and Schaefer H.F. J. Phys. Chem., A 103 (1999) 5581
15. Shimoda T., Matsuki Y., Furusawa M., Aoki T., Yadusaka I., Tanaka H., Iwasawa H., Wang D., Miyasaka M., and Takeuchi Y. Nature 440 (2006) 783
16. Rosenberg L. Nature 440 (2006) 749
17. Sturm J.C., and Chung K.H. ECS Trans. 6 1 (2007) 429
18. Onischuk A.A., Levykin A.I., Strunin V.P., Sabelfeld K.K., and Panfilov V.N. J. Aerosol Sci. 31 (2000) 1263
19. Nijhawan S., McMurry P.H., Swihart M.T., Suh S.M., Girshick S.L., Campbell S.A., and Brockmann J.E. J. Aerosol Sci. 34 (2003) 691
20. Kremer D.M., Davis R.W., Moore E.F., Maslar J.E., Burgess D.R., and Ehrmann S.H. J. Electrochem. Soc. 150 (2003) G127
21. Hollandsworth R.P., and Ring M.A. Inorg. Chem. 7 (1968) 1635
22. Feher F., Plichta P., and Gullery R. Inorg. Chem. 10 (1971) 606
23. Drake J.E., and Westwood N.P.C. J. Chem. Soc., A (1971) 3300
24. Jenkins R.L., Vanderwielen A.J., Ruis S.P., Gird S.R., and Ring M.A. Inorg. Chem. 12 (1973) 2968
25. Bell T.N., Perkins K.A., and Perkins P.G. J. Phys. Chem. 86 (1982) 3922
26. Swihart M.T., and Carr R.W. J. Phys. Chem. A 102 (1998) 785
27. Gupper A., and Hassler K. Eur. J. Inorg. Chem. (2001) 2007
28. Drake J.E., Goddard N., and Westwood N.P.C. J. Chem. Soc., A (1971) 3305-3308
29. Violette K.E., O'Neil P.A., Ozturk M.C., Christiansen K., and Maher D.M. Appl. Phys. Lett. 68 (1996) 66-68
30. Aoyama T., Saito S., and Tatsumi T. Thin Solid Films 321 (1998) 256
31. Schlyer D.J., Wolf A.P., and Gaspar P.P. J. Phys. Chem. 82 (1978) 2633
32. Niki H., Maker P.D., Savage C.M., and Breitenbach L.P. J. Phys. Chem. 89 (1985) 1752
33. Chasovnikov S.A., and Krasnoperov L.N. Chem. Phys. Lett. 124 (1986) 248
34. Chesnokov E.N., and Panfilov V.N. Chem. Phys. 92 (1985) 471
35. Ding L., and Marshall P. J. Phys. Chem. 96 (1992) 2197
36. Conner C.P., Stewart G.W., Lindsay D.M., and Gole J.L. J. Am. Chem. Soc. (1977) 2540
37. Bell T.N., Perkins K.A., and Perkins P.G. J. Organomet. Chem. 217 (1981) 311
38. M. Bauer et al., unpublished.
39. Aivazyan R.G., and Azatyan V.V. Chem. Phys. Rep. 16 (1997) 621
40. Ding L., and Marshall P. J. Am. Chem. Soc. 114 (1992) 5754
41. Thomas S.G., Bauer M., Stephens M.D., and Kouvetakis J. Solid State Technol. (2009) 12 April
42. P. Tomasini, C. Arena, M. Bauer, N. Cody, R. Bertram, J. Wen, M.D. Stephens, patent application US20080026149.
43. de Wijs G.A. Phys. Rev. Lett. 78 (1997) 4877
44. Kohanek J.J., Estacio P., and Ring M.A. Inorg. Chem. 8 (1969) 2516
45. Ring M.A., Puentes M.J., and O'Neal H.E. J. Am. Chem. Soc. 92 (1970) 4845
46. Davidson I.M.T. J. Organomet. Chem. 24 (1970) 97
47. Qu Y.-Q., Li J., and Han K.-L. J. Phys. Chem., B 108 (2004) 15103
48. McKean D. J. Phys. Chem., A 107 (2003) 6538
49. Dragnea B., Boulmer J., Debarre D., and Bourguignon B. J. Appl. Phys. 90 (2001) 449
50. Kang J.K., and Musgrave C.B. J. Chem. Phys. 116 (2002) 9907-9913
51. Azatyan V.V., Borisov A.A., Merzhanov A.G., Kalachev V.I., Masalova V.V., Mailkov A.E., and Troshin K.Y. Combust. Explos. Shock Waves 41 (2005) 1
52. Avetsisyan A.A., Azatyan V.V., Kalachev V.I., Masalova V.V., and Piloyan A.A. Kinet. Catal. 48 (2007) 8
53. Baird R.B., Sefcik M.D., and Ring M.A. Inorg. Chem. 10 (1971) 883
54. Vanderwielen A.J., Ring M.A., and O'Neal H.E. J. Am. Chem. Soc. 97 (1975) 993
55. M. Bauer, P. Tomasini, patent application US20090111246.