Equilibrium morphologies for Cl-roughened Si(100) at 700–750 K: Dependence on Cl concentration

Physical Review B - Condensed Matter and Materials Physics

Volumn 67, Issue 12, 2003, Pages

  Xu, G J ^a   Nakayama, Koji S ^a   Trenhaile, B R ^a   Aldao, C M ^b   Weaver, J H ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSIDAD NACIONAL DE MAR DEL PLATA   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; DIMER; SILICON;

ADSORPTION; ARTICLE; CONCENTRATION RESPONSE; DENSITY; EQUILIBRIUM CONSTANT; MOLECULAR INTERACTION; MOLECULAR MECHANICS; MOLECULAR SIZE; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTY; TEMPERATURE DEPENDENCE;

EID: 0037544054     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.67.125321     Document Type: Article

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