An investigation of particle dynamics in a rotating disk chemical vapor deposition reactor

Journal of the Electrochemical Society

Volumn 150, Issue 2, 2003, Pages

  Kremer, D M ^a   Davis, R W ^b   Moore, E F ^b   Maslar, J E ^b   Burgess Jr , D R ^b   Ehrman, S H ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; HEAT TRANSFER; LIGHT SCATTERING; NUCLEATION; REACTION KINETICS; SILANES; THIN FILMS;

PARTICLE DYNAMICS;

SEMICONDUCTING SILICON;

EID: 0037329262     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1536180     Document Type: Article

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