SCOPUS 정보 검색 플랫폼

Analytical and Bioanalytical Chemistry

Volumn 396, Issue 1, 2010, Pages 105-114

Molecular sputter depth profiling using carbon cluster beams

(2) Wucher, Andreas a Winograd, Nicholas b

a UNIVERSITY OF DUISBURG ESSEN (Germany)

b PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

Carbon clusters; Cluster ion beams; Cluster SIMS; Molecular depth profiling

Indexed keywords

CARBON ATOMS; CHEMICAL DAMAGES; CLUSTER IMPACT; CLUSTER ION BEAMS; CLUSTER SIMS; DEPTH RESOLUTION; FILM INTERFACES; FULLERENE IONS; ION IMPACT ENERGY; MODEL EXPERIMENTS; MOLECULAR DEPTH PROFILING; ORGANIC FILMS; ORGANIC MULTILAYERS; ORGANIC SAMPLES; SAMPLE TEMPERATURE; SILICON SUBSTRATES; SPUTTER EROSION; SPUTTER-DEPTH PROFILING;

BEAM PLASMA INTERACTIONS; DEPTH PROFILING; FULLERENES; ION BEAMS; ION BOMBARDMENT; IONS; ORGANIC CARBON; PROJECTILES; SECONDARY ION MASS SPECTROMETRY;

CARBON CLUSTERS;

CARBON; ORGANIC COMPOUND; SILICON;

CHEMISTRY; MASS SPECTROMETRY; REVIEW; SURFACE PROPERTY;

CARBON; MASS SPECTROMETRY; ORGANIC CHEMICALS; SILICON; SURFACE PROPERTIES;

EID: 72849111884 PISSN: 16182642 EISSN: 16182650 Source Type: Journal
DOI: 10.1007/s00216-009-2971-x Document Type: Review

Times cited : (39)

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