Role of nitrogen in the formation of HC-N films by CH4/N 2 barrier discharge plasma: Aliphatic tendency

Journal of Physical Chemistry B

Volumn 113, Issue 48, 2009, Pages 15734-15741

  Majumdar, Abhijit ^a   Das, Gobind ^b   Basvani, Kaleswara Rao ^a   Heinicke, Joachim ^a   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CHEMICAL ANALYSIS; CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; CYANIDES; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; FLUORINE CONTAINING POLYMERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASS SPECTROMETRY; NITRIDES; NITROGEN; PLASMAS;

BARRIER DISCHARGE PLASMAS; CARBON AND NITROGEN; DEPOSITION TIME; DIELECTRIC BARRIER DISCHARGE PLASMAS; ELEMENTAL ANALYSIS; FOURIER TRANSFORM INFRARED ABSORPTION SPECTRUM; HYDROGENATED CARBON; IN-VACUUM; ISONITRILES; LINEAR CHAIN; MASS SPECTRA; MOLECULAR BAND; NITRILE GROUPS; NITROGEN CONCENTRATIONS; NITROGEN CONTENT; NITROGEN PARTIAL PRESSURES; PROTON NMR;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 72149131457     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp906654m     Document Type: Article

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